Aprisa and Apogee support double patterning-compliant design rules while maintaining desirable routability for complex designs at 20nm

SANTA CLARA, Calif.--(BUSINESS WIRE)-- ATopTech, the leader in next generation physical design solutions, today announced that Aprisa™ and ApogeeTM, the company’s place and route solution, are included in TSMC’S 20nm Reference Flow. TSMC’S 20nm process technology delivers better performance and lower power consumption than previous generations. TSMC and ATopTech collaborated in incorporating ATopTech tools in the 20nm Reference Flow to address the increasing design challenges for 20nm.