Research and Markets: Ultra Clean Processing of Semiconductor Surfaces X Includes All Issues Related To Contamination, Cleaning and Surface Preparation

DUBLIN--(BUSINESS WIRE)-- Research and Markets ( has announced the addition of the "Ultra Clean Processing of Semiconductor Surfaces X" report to their offering.

Series: Solid State Phenomena, Volume 187

Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium

The International Symposium on Ultra-Clean Processing of Semiconductor Surfaces (UCPSS) is a bi-annual conference which has been organized by IMEC since 1992. The scope of the symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacture. At first, silicon was typically the main semiconductor of interest. As other semiconducting materials such as SiGe, SiC, Ge and III-V compounds came under consideration for future devices, the scope was broadened so as to include these materials. Parallelling the fast-moving CMOS industry, the photovoltaic industry has also recognized the need to make improvements in cleaning. Moreover, in order to promote these semiconductor cleaning activities in PV, it was decided to add a special session focused on this topic.

Table of Contents (80 papers, 10 per page listed)

Exploratory Materials and Devices to Advance CMOS beyond the Classical Si Roadmap

Marc M. Heyns

Wet Chemical Cleaning of InP and InGaAs

Rita Vos, Sophia Arnauts, Thierry Conard, Alain Moussa, Herbert Struyf, Paul W. Mertens

Achieving Ultra-Shallow Junctions in Future CMOS Devices by a Wet Processing Technique

Joel Barnett, Richard Hill, Prashant Majhi

Low-k Integration Using Metallic Hard Masks

O. Joubert, Nicolas Possémé, Thierry Chevolleau, Thibaut David, M. Darnon

Modification of Post-Etch Residues by UV for Wet Removal

Quoc Toan Le, F. Drieskens, T. Conard, M. Lux, J.F. de Marneffe, H. Struyf, G. Vereecke

Production of High Purity Functional Water at Point-of-Use for Advanced Mask Cleaning Processes

Annie Y. Xia

Ozone Based Chemical Oxide Growth for Crystalline Solar Cell Production

Klaus Wolke, Christiane Gottschalk, Jochen Rentsch, Heike Angermann

Surface Contamination of Silicon Wafer after Acidic Texturisation

Antje Oltersdorf, Ana Moldovan, Michael Bayer, Martin Zimmer, Jochen Rentsch

HF Last Passivation for High Efficiency a-Si/c-Si Heterojunction Solar Cells

Adrien Danel, Florent Souche, Thomas Nolan, Yannick Le Tiec, P.J. Ribeyron

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Sector: Semiconductor

Source: Research and Markets